Valves for Atomic Layer Depostion: ALD Diaphragm Valves

Swagelok ALD diaphragm valves offer ultrahigh cycle life, high-speed actuation, and flow coefficients up to 0.62, along with thermal actuators, position sensors, and solenoids for optimal performance in atomic layer deposition applications.

Details

  • Ultrahigh cycle life with high-speed actuation
  • Cv range from 0.27 to 0.62 
  • Up to 392°F (200°C) capability with thermal actuators
  • Electronic actuator position-sensing option
  • Suitable for ultrahigh-purity applications with 316L VIM-VAR stainless steel
  • VCR®, tube butt weld, and 1.125 in. and 1.5 in. modular surface-mount end connection

Swagelok ALD ValveTechnical Report

  • Helium seat leak testing
  • Valve flow consistency analysis 
  • lab cycle testing
  • Actuator thermal isolation and valve thermal response
  • Particle counting
  • Surface finish
  • Moisture Analysis
  • Hydrocarbon analysis
  • Pneumatic actuation response

Customer Success Story

Swagelok ALD valves enabled Cambridge NanoTech and its customers to dramatically reduce the overall cost of ownership for Atomic Layer Deposition processing

PDF_symbolonly For access to the literature, fill the form on this page.

Get the Literature